September 8, 2026. With more than one million wafers processed to date, Intel Foundry and ASML are helping their customers adopt high numerical aperture (High NA) EUV today while preparing for future scaling. Intel Foundry and ASML have now highlighted the ongoing progress in bringing high numerical aperture (High NA) EUV lithography into mass production, as well as in advancing the technologies that will shape its future adoption.
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“Intel Foundry was one of the key pioneers in the industry’s adoption of High NA—from the installation of the first commercial EXE system in 2024, through the qualification of the latest generation of tools, to the shipment of the first high-volume logic product manufactured using High NA,” said Christophe Fouquet, President and CEO of ASML. “ASML recognizes Intel Foundry’s leadership in High NA and its innovations, which are already delivering value today with 6-inch masks, as well as its long-standing support for the transition to 6×12-inch masks.”
“The companies developing the increasingly complex AI products of the future need manufacturing innovations that are production-ready and easy to implement,” said Naga Chandrasekaran, Executive Vice President at Intel and Co-General Manager of Intel Foundry. “As part of our lithography capabilities, Intel Foundry is focused on the near-term implementation of high NA on 6-inch masks, with or without stitching, as well as the transition to 6×12-inch masks. We will continue to work closely with ASML and the entire industry to enable this transition.”
Intel Foundry and ASML are building on their long-standing collaboration to unify the lithography ecosystem around large-format masks, thereby driving the standards, infrastructure, and technological advancements necessary to support future high-NA EUV scaling. In collaboration with mask manufacturers, automation providers, EDA partners, material suppliers, and semiconductor manufacturers, the companies have helped pave the way for the industry’s move toward large-format masks while enabling customers to reap the benefits of high-NA EUV today.
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Photo: Intel
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