DAS Environmental Experts: ALCEA – for integrated NOx treatment in semiconductor fabs

In semiconductor fabs, additional capacity for emissions reduction competes for limited and costly space in the subfab. At the same time, manufacturers are striving to reduce media consumption, maintenance costs, and operational downtime. ALCEA addresses these requirements with a highly integrated architecture: The catalyst unit is integrated directly into the exhaust air duct and therefore requires no additional floor space in the subfab. The solution is designed for retrofitting existing exhaust air systems and can be used with various NOx-generating exhaust gas treatment technologies.

Plasma-assisted catalysis without the addition of special process gases

ALCEA is based on the proven plasma-assisted catalyst technology from DAS Environmental Experts. This process generates reactive oxygen species (ROS), which trigger reactions at the catalyst surface. The process converts NOx into more highly oxidized, water-soluble nitrogen compounds, which can then be removed in a downstream central wet exhaust gas treatment system. No special gases need to be supplied for the dry oxidation process. The catalysts used are reusable.

Depending on the NOx concentration, upstream treatment, and plasma power, ALCEA processes volumetric flow rates of up to 5,000 standard liters per minute and achieves an NOx reduction of up to 95 percent. Power consumption is up to 3.2 kW, depending on the NOx concentration. The system supports up to two catalyst channels for dual systems or two separate local exhaust gas treatment systems. Process cooling water, reusable catalysts, and a design optimized for low maintenance and minimal downtime facilitate integration into ongoing fab operations.

ALCEA was developed within one of the world’s leading semiconductor ecosystems and was created in collaboration with the Industrial Technology Research Institute (ITRI), Taiwan’s leading research institute for applied technologies. The engineering team at DAS Environmental Experts in Taiwan played a central role in its development.

The project combines applied research, industrial engineering expertise, and close ties to semiconductor customers. At the same time, it expands the company’s exhaust gas treatment portfolio with a compact DeNOx solution for the post-treatment of combustion exhaust gases, suitable for both new and existing fab installations.

The market launch at SEMICON Taiwan underscores the importance of DAS Environmental Experts’ regional teams for customer-focused innovation and local value creation. Visitors to SEMICON Taiwan 2026 can learn more about ALCEA and the company’s comprehensive portfolio for exhaust gas and wastewater treatment.

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