SilcoTek’s CVD silicon-based coatings are used in the semiconductor industry, among other industrial applications. The various surface finishes offer, for example, reliable and long-lasting corrosion protection, as well as an effective method of reducing metallic contamination in the process environment of production equipment.
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SilcoTek’s CVD silicon-based coatings are used in the semiconductor industry, among other industrial applications. The various surface finishes offer, for example, reliable and long-lasting corrosion protection, as well as an effective method of reducing metallic contamination in the process environment of production equipment.
Among other things, the variants of the various SilcoTek coatings help to significantly increase the useful life of important gas-carrying components of gas purification and gas supply equipment, thus helping to reduce operating costs, as well as improving the respective equipment availability.
Special surface properties of some coatings deposited by means of the CVD process result, among other things, in a significant reduction in the adhesion of H2O water vapor residues to the process-relevant components. Flushing times and comparable activities, for example after maintenance work in water vapor-sensitive process applications, are thus significantly reduced.
A major chip manufacturer from the USA confirms that the newly developed Siltride® coating from SilcoTek®, a silicon oxy-nitrite, was able to significantly reduce corrosion on critical parts. This significantly improves the release of heavy metals in the exhaust area of the equipment, as well as the service life of the components used in general.
The coating contributes to a much more sustainable operation of the production plants, increases plant availability, process stability and reduces maintenance and spare parts costs.
Other applications of coatings in the semiconductor industry include gas supply components, pressure regulators, valves, process chambers in applications such as epitaxial CMP and wet etch equipment, and plasma process applications. In addition, in processes where a barrier layer can help reduce the risk of contamination from metallic contaminants.
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👉 www.silcotek.de
👉 Case study of SilcoTek’s collaboration with Samsung Austin Semiconductor
👉 ASMC publication (SEMI’s Advanced Semiconductor Manufacturing Conference)
Photo: SilcoTek
