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AP&S International GmbH

Company type

Target markets

batch- and single wafer wet process equipment·eless plating·parts cleaning equipment

Industries

Micro- / Nanoelektronics·other

Portfolio

batch- and single wafer wet process equipment·eless plating·Equipment·Micro- / Nanoelektronics·other·parts cleaning equipment·Semiconductor Industry

Certificates

Contact

Obere Wiesen 9
78166 Donaueschingen
https://www.ap-s.de

Contact Person

Thomas Gebhardt
+49 351 8925 - 973
Manager Technical Sales
 Thomas Gebhardt

About this member

FULL RANGE OF WET PROCESS SOLUTIONS

We deliver advanced, high-performance wet surface treatment equipment to the industry’s leading semiconductor fabs worldwide. The AP&S wet process range includes manual, semi-automated and fully automated wet process equipment for up to 300mm wafers. The AP&S solutions perfectly cover batch as well as single wafer processing. Etch processes, surface conditioning, resist develop, resist strip, metal lift-off, metal etch, electroless metal deposition, wafer cleaning and drying applications are all included in the AP&S portfolio.

Our hardware is perfectly adapted to the requirements of the microstructuring industry: high throughput, innovative and cost-efficient processing, optimized footprint and most reliable process results are the characteristics of the AP&S wet process equipment.

AP&S offers innovative wet process technologies for wafer processing in the microchip fabrication process, including cleaning, etching, resist strip, resist development, metal etching, electroless metal deposition for Under Bump Metallization, lift-off and wafer drying technologies.

With a wide range of modular wet process equipment using various techniques such as immersion, spin and spray AP&S is well positioned to meet the specific needs of the semiconductor industry.

At the AP&S Demo Center, an in-house laboratory at our German headquarters, we offer wet process demonstrations for wafers, masks and other substrates.

Automated wet bench

TwinStep, MultiStep, GigaStep & A-Series

AP&S offers wet equipment platforms starting from basic manual wet benches on laboratory or R&D level up to fully-automatic high volume production and high-end technology tools.
Depending on the wet cleaning or wet etching application there are different standard features availble that can be covered in our modular wet bench platforms. Customization due to special application, wafer material or product design is our daily business.

AP&S GigaStep
Carrier and box cleaner

CleanStep Family – CBII, CBIII & CleanSurF

CLEANSURF

NEW AP&S CLEANER FOR EFFICIENT PARTICLE AND AMC (AIRBORNE MOLECULAR CONTAMINATION) REMOVAL ON THE SURFACES OF ALL COMMON TYPES OF CARRIERS, BOXES, SMIF-POD’S AND FOUP’S

CBII, CBIII

EFFICIENT CLEANING TOOL FOR ALL COMMON TYPES OF CARRIER, BOXES, SMIF-POD’S AND FOUP’S

AP&S CleanSurF
Chemical Management System

THE CHEMICAL MANAGEMENT SYSTEM HANDLES ACIDS, SOLVENTS AND CAUSTICS USED IN THE SEMICONDUCTOR-, MEMS- AND MICRO-STRUCTURING INDUSTRIES AS WELL AS IN THE R&D SECTOR

AP&S CDS
ELECTROLESS PLATING NI / PD / AU FOR UBM (UNDER BUMP METALLIZATION)

VULCANIO – FULLY AUTOMATED ELECTROLESS PLATING TOOL FOR WAFERS UP TO 300MM

Vulcanio – a fully automated eless UBM metallization tool for wafers up to 300 mm is our answer to the increasing importance of flip-chip bonding and further miniaturization of devices.

More and more devices are migrating from wire bonding to flip-chip to overcome the technical limitations of bonding technologies such as electrical resistance or geometric dimensions. Underbump metallization (UBM) is used as an alternative for the various device metallization options such as Al, Al alloys and Cu to act as an electrical contact, bonding layer and protective layer between the chip metallization and the subsequent solder bump technology. In this context, UBM deposition including pre- and post-wafer treatment is crucial for interface stability and reliability performance of the entire device.

For semiconductor manufacturing, the implementation of advanced, reliable UBM process technologies, highest throughput achievement and best TCoO performance of the production equipment are key success factors in this context.

The AP&S Vulcanio covers all these factors perfectly. Indeed, the batch tool was specially developed for under-bump metallization with electroless deposition technology on Al- and Cu-based substrates for metallization with nickel, palladium and gold. It has already been successfully used for mass production by leading semiconductor manufacturers since 2009. Since then, the system has been continuously developed and optimized in close cooperation with AP&S customers.

These are the 7 Vulcanio facts that convince:

1. The fully automated high-throughput wet bench processes 50 wafers per batch.

2. Different wafer thicknesses, including thin wafers and TAIKO, can be processed with Vulcanio without any equipment modification.

3. Unique software and hardware features ensure exceptional deposition uniformity, highest process stability as well as bath longevity: Ni-bath with a bath life of 1-1.5 weeks, Pd-bath with 5 to 7 days and Au-bath with a bath lifetime of up to several months.

4. Thanks to a superior control system, reduction of Au metal thicknesses from > 0.5 µm to 0.05 µm is possible without sacrificing performance. Thinner Au metal layers in turn bring advantageous cost savings and lower risk of Au embrittlement in solder joints.

5. The high automation of the wet process tool ensures very high precision of the process steps with a superior operating cost ratio.

6. The equipment concept including individual tank and material design optimally support the process capabilities. Various Vulcanio machine layouts are available according to customer requirements.

7. The excellent reliability performance on wafers, from – 40 degr. C to + 125 degr. C., has been scientifically proven.

The long use in the market, the continuous analysis and optimization in close cooperation with our customers, the scientifically proven good performance and the very positive customer feedback, characterize the AP&S e-less Vulcanio. For more information and technical data please contact our sales team: sales@ap-s.de













AP&S Vulcanio
Single wafer equipment

SpinStep Flex Line

The modular, versatile single wafer wet system SpinStep is designed for single wafer etching, cleaning, lift-off, coating and developing.

At our demo process laboratory in Donaueschingen we can run spin process demonstrations with wafers, masks or other substrates.

AP&S SingleWafer

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