MK Versuchsanlagen GmbH & Co. KG

In the semiconductor industry, metal-free systems are an integral part of many process and production setups. At MK metal-free Workstations we manufacture metal-free equipment individually tailored to specific processes, developed and designed according to customer requirements. Laminar flow across the entire work area additionally enables operation under the cleanest conditions (e.g., cleanroom class 3 according to DIN EN ISO 14644 or better). With controlled supply and exhaust air, the focus is on ensuring both product and user protection simultaneously. Common components such as cleaning sinks, ultrasonic baths, or etching basins are custom-made from suitable materials and installed flush and ergonomically into the system. Process equipment such as spin coaters can also be integrated into the workbenches.

Our metal-free Wet Bench stands out due to its modular design, allowing it to be individually configured to meet your process requirements. The protection of both product and user is our top priority. Product protection is achieved through clean, particle-free workspaces of cleanroom class 3* or better, while user protection is ensured by front-sliding controlled airflow volumes**. The use of various inert plastics provides excellent corrosion resistance.

If there is insufficient supply air capacity available in the building, we offer a version with integrated room air intake.
To reduce operating costs, we also offer a variant with an intelligent control system that lowers energy consumption.

* According to DIN EN ISO 14644
** According to DIN EN 14175

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After the chemical treatment of wafers for cleaning, etching or stripping applications, it is important to rinse all components properly to avoid chemical residues. Once removed from the chemical bath, the wafer surface is still covered with chemicals that cause a continuous chemical process outside the bath. This chemical process can lead to over-etching or detachment, resulting in production downtime.

To avoid these problems, it is necessary to rinse the wafers properly with Dl water using a quick dump rinse or a quench.

The Quick dump rinse basin (QDR-basin) has a modular design. It is therefore possible to disassemble the QDR tank into two separate components and remove them from the system. Additional comfort is provided by the spray and drain system, which is designed to be removed, cleaned or replaced together with the process tank.

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