Plasma Etching Explained: The Revolution in Micro and Nanoengineering

Abstract

With the EU-funded project HaloFreeEtch, a new era in micro- and nanoengineering is unfolding—aiming to establish sustainable, halogen-free etching processes for the semiconductor industry. Join us to explore the future of plasma etching technology!

In this first session of our webinar series, three expert talks will guide you through the evolving landscape of plasma etching: from a foundational introduction to the technology, to a focus on the BOSCH process—an innovation that reshaped the field in 1994—and a look at groundbreaking applications that would not be possible without deep etching.

Agenda

• 11:00 – 11:15 – Introduction to the HaloFreeEtch webinar series | Jörg Schuster, Chemnitz university of Technology, coordinator of HaloFreeEtch
• 11:55 – 12:15 – Plasma Etching: A key technique for micro and nano patterning in chip manufacturing | Micha Haase, Fraunhofer ENAS
• 11:15 – 11:35 – The BOSCH process for deep reactive etching – how it pioneered high aspect ration etching for applications in everyday live | Andrea Urban, Robert Bosch GmbH
• 11:35 – 11:55 – Applications enabled by high aspect ratio etching | Wim De Malsche, MICROLAB (Vrije Universiteit Brussel)
• 12:15 – 12:30 – Q&A Session | All