ALD FOR INDUSTRY

The 9th International Conference ALD FOR INDUSTRY will again bridge the gap between fundamental science, industrialization and commercialization of this technology. Atomic layer deposition (ALD) is a process for depositing a variety of thin film materials from the vapor phase of matter. The growth of this technology is not only based in microelectronics applications, but also in areas of industrial Li-Ion batteries, photovoltaics, optics, light, biomedicine and quantum technology.

This event is already established since 2017 and attracts annually more than 100 participants and numerous exhibitors to visit Dresden. The Conference with Tutorial provides the opportunity to learn more about fundamentals of ALD technology, to get informed about recent progress in the field and to get in contact with industrial and academic partners. Increase your visibility and present your company in our accompanying exhibition.

This time, the Conference will take place in Eindhoven, Netherlands.

PREVIEW

• Tutorials
• International Conference
• Exhibition
• Poster Session

PROGRAM COMMITTEE

• Sean Barry, Carleton University, Canada
• Gloria Gottardi, Fondazione Bruno Kessler, Italy
• Christoph Hossbach, Applied Materials, Germany
• Martin Knaut, TU Dresden, Germany
• Harm Knoops, University Eindhoven & Oxford Instruments Plasma Technology, Netherlands
• Laura Nyns, IMEC, Belgium
• Fred Roozeboom, University Twente, Netherlands
• Jonas Sundqvist, Alixlabs, Sweden