41st Mask and Lithography Conference EMLC 2026

The EMLC Conference

Annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. The EMLC is dedicated to research, technology and related processes. It provides an overview of the current state of mask and lithography technologies and future strategy. Within this platform, researchers and users have the opportunity to both familiarize themselves with the latest developments and results as well as to enter into fruitful discussion with colleagues from different companies and research institutions.

May we invite you to Jena, the place where Ernst Abbe and Carl Zeiss built the core of the science-based optical industry in Europe, venue for the EMLC 2026!

Jena is located in Thuringia – also called the “green heart of Germany” and is well known as the “City of Light”. This nickname underscores the role of light for the famous history and present of the city. This is the place where 170 years ago Carl Zeiss, Otto Schott and Ernst Abbe built the foundation of the physics- based optical industry. In our days it is the city of numerous hightec companies like ZEISS, Jenoptik or Vistec, home of the about 450 years old Friedrich Schiller University and numerous scientific institutes and a vibrant startup scene.

ZEISS Award for Talents in Photomask Industry - Submit your paper!

Turn your research into recognition and submit your paper in the field of lithography and photomasks now and win participation in the ZEISS European Summer School along with a 2,500 EUR prize.

Take this opportunity to showcase your ideas and research, receive valuable feedback und connect with experts. The award will be presented at the European Mask and Lithography Conference 2026. The abstract submission deadline is January 27, 2026.